Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structures

dc.contributor.author	Stevens, Rudi
dc.contributor.author	Witvrouw, Ann
dc.contributor.author	Roussel, Philippe
dc.contributor.author	Maex, Karen
dc.contributor.author	Meynen, Herman
dc.contributor.author	Cuthbertson, Alan
dc.date.accessioned	2021-09-29T13:17:24Z
dc.date.available	2021-09-29T13:17:24Z
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/900
dc.source	IIOimport
dc.title	Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structures
dc.type	Journal article
dc.contributor.imecauthor	Roussel, Philippe
dc.contributor.imecauthor	Maex, Karen
dc.contributor.orcidimec	Roussel, Philippe::0000-0002-0402-8225
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	208
dc.source.endpage	214
dc.source.journal	Appl. Surf. Sci.
dc.source.volume	91
imec.availability	Published - imec
imec.internalnotes	Proceedings of the 1st European Workshop on Materials for Advanced Metallization. Radebeul, Germany, March 19-22, 1995.