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VPD-DC-TXRF for metallic contamination analysis of Ge wafers

dc.contributor.authorHellin, David
dc.contributor.authorGeens, Veerle
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorRaskin, Geoffroy
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T13:46:12Z
dc.date.available2021-10-15T13:46:12Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9015
dc.sourceIIOimport
dc.titleVPD-DC-TXRF for metallic contamination analysis of Ge wafers
dc.typeOral presentation
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference7th International Symposium on Ultra Clean Processing - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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