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Validation of vapor phase decomposition - droplet collection - total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

dc.contributor.authorHellin, David
dc.contributor.authorRip, Jens
dc.contributor.authorArnauts, Sophia
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T13:46:38Z
dc.date.available2021-10-15T13:46:38Z
dc.date.issued2004-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9017
dc.sourceIIOimport
dc.titleValidation of vapor phase decomposition - droplet collection - total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers
dc.typeJournal article
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage1149
dc.source.endpage1158
dc.source.journalSpectrochim. Acta B
dc.source.issue8
dc.source.volume59
imec.availabilityPublished - imec


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