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Optical extensions towards the 45-nm node

dc.contributor.authorHendrickx, Eric
dc.contributor.authorMonnoyer, Philippe
dc.contributor.authorVan Look, Lieve
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-15T13:47:51Z
dc.date.available2021-10-15T13:47:51Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9023
dc.sourceIIOimport
dc.titleOptical extensions towards the 45-nm node
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage357
dc.source.endpage368
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; vol. 5377


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