dc.contributor.author | Tavares, J. | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Wu, Ming Fang | |
dc.contributor.author | Vantomme, Andre | |
dc.contributor.author | Langouche, G. | |
dc.contributor.author | Lin, Chia-Hui | |
dc.date.accessioned | 2021-09-29T13:17:29Z | |
dc.date.available | 2021-09-29T13:17:29Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/903 | |
dc.source | IIOimport | |
dc.title | HREM characterization of ion beam synthesized ternary silicides in (111) silicon | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Vantomme, Andre | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 533 | |
dc.source.endpage | 536 | |
dc.source.conference | Microscopy of Semiconducting Materials 1995. Proceedings | |
dc.source.conferencedate | 20/03/1995 | |
dc.source.conferencelocation | Oxford UK | |
imec.availability | Published - open access | |
imec.internalnotes | IOP Conference Series; Vol. 146 | |