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Evaluation of megasonic cleaning processes

dc.contributor.authorHolsteyns, Frank
dc.contributor.authorRiskin, A.
dc.contributor.authorVereecke, Guy
dc.contributor.authorMaes, A.
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-15T13:53:13Z
dc.date.available2021-10-15T13:53:13Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9047
dc.sourceIIOimport
dc.titleEvaluation of megasonic cleaning processes
dc.typeProceedings paper
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage161
dc.source.endpage167
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-26


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