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Effective post-etch residue removal on low-K films using single wafer processing

dc.contributor.authorKesters, Els
dc.contributor.authorGhekiere, John
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T14:08:59Z
dc.date.available2021-10-15T14:08:59Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9120
dc.sourceIIOimport
dc.titleEffective post-etch residue removal on low-K films using single wafer processing
dc.typeProceedings paper
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage15
dc.source.endpage22
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-26


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