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Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion

dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBruls, R.
dc.contributor.authorGrenville, A.
dc.contributor.authorVan Peski, C.
dc.date.accessioned2021-10-15T14:12:54Z
dc.date.available2021-10-15T14:12:54Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9138
dc.sourceIIOimport
dc.titleInitial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
dc.typeProceedings paper
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Bisschop, Peter
dc.source.peerreviewno
dc.source.beginpage1679
dc.source.endpage1688
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5377


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