Show simple item record

New process for controlled formation of ultra-thin PtSi films for infra-red detector applications

dc.contributor.authorTorres Jacome, Alfonso
dc.contributor.authorKolodinski, Sabine
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorMaex, Karen
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-09-29T13:17:51Z
dc.date.available2021-09-29T13:17:51Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/913
dc.sourceIIOimport
dc.titleNew process for controlled formation of ultra-thin PtSi films for infra-red detector applications
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBender, Hugo
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage185
dc.source.endpage190
dc.source.conferenceGrowth and Characterization of Materials for Infrared Detectors II
dc.source.conferencedate13/07/1995
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2554


Files in this item

Thumbnail
Name:
888.pdf
Size:
1.027Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record