Show simple item record

Design split and double exposure for contact hole printing at 0.40 k1 and beyond

dc.contributor.authorKöhler, Carsten
dc.contributor.authorvan Praagh, Judith
dc.contributor.authorFinders, Jo
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-15T14:13:20Z
dc.date.available2021-10-15T14:13:20Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9140
dc.sourceIIOimport
dc.titleDesign split and double exposure for contact hole printing at 0.40 k1 and beyond
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.conferenceProceedings 41st Interface Symposium
dc.source.conferencedate26/09/2004
dc.source.conferencelocationTempe, AZ USA
imec.availabilityPublished - imec
imec.internalnotesproceedings on CD-Rom or Litho-Share: \nt4\litho\NewLithoShare\Litho_Operation\Presentations Publications\Conference_Proceedings\Interface2004


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record