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Sub-65nm etch challenges of high-k and metal gate materials
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Authors
Kota, Gowri P.
;
Ramalingam, Shyam
;
Lee, Steve
;
Coenegrachts, Bart
;
Lee, Chris
;
Beckx, Stephan
;
Demand, Marc
;
Boullart, Werner
Conference
26th International Symposium on Dry Process
Title
Sub-65nm etch challenges of high-k and metal gate materials
Publication type
Proceedings paper
Embargo date
9999-12-31
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