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Selective wet etching of Hf-based layers on a single-wafer spin processor

dc.contributor.authorKraus, Harald
dc.contributor.authorKovacs, F.
dc.contributor.authorSnow, Jim
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T14:14:47Z
dc.date.available2021-10-15T14:14:47Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9146
dc.sourceIIOimport
dc.titleSelective wet etching of Hf-based layers on a single-wafer spin processor
dc.typeProceedings paper
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage485
dc.source.endpage492
dc.source.conferenceProceedings of the 3rd International Conference on Semiconductor Technology - ISTC
dc.source.conferencedate15/09/2004
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; Vol. 2004-11


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