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Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

dc.contributor.authorKraus, P.A.
dc.contributor.authorChua, T.C.
dc.contributor.authorAhmed, K.Z.
dc.contributor.authorCampbell, J.
dc.contributor.authorNouri, F.
dc.contributor.authorCruise, J.
dc.contributor.authorRothschild, Aude
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Sofie
dc.contributor.authorSchaekers, Marc
dc.contributor.authorCubaynes, F.N.
dc.contributor.authorDate, Lucien
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorBauer, T.M.
dc.date.accessioned2021-10-15T14:15:35Z
dc.date.available2021-10-15T14:15:35Z
dc.date.issued2004
dc.identifier.issn1355-8633
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9149
dc.sourceIIOimport
dc.titleFurther optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS
dc.typeJournal article
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDate, Lucien
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage73
dc.source.endpage76
dc.source.journalSemiconductor Fabtech
dc.source.issue23
imec.availabilityPublished - open access


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