Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

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Authors

Kraus, P.A.; Chua, T.C.; Ahmed, K.Z.; Campbell, J.; Nouri, F.; Cruise, J.; Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, F.N.; Date, Lucien; Schreutelkamp, Rob; Bauer, T.M.

ISSN

1355-8633

Issue

23

Journal

Semiconductor Fabtech

Title

Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

Publication type

Journal article

Embargo date

9999-12-31

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