Publication:

Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

Date

2004
Journal article
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dc.contributor.authorKraus, P.A.
dc.contributor.authorChua, T.C.
dc.contributor.authorAhmed, K.Z.
dc.contributor.authorCampbell, J.
dc.contributor.authorNouri, F.
dc.contributor.authorCruise, J.
dc.contributor.authorRothschild, Aude
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Sofie
dc.contributor.authorSchaekers, Marc
dc.contributor.authorCubaynes, F.N.
dc.contributor.authorDate, Lucien
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorBauer, T.M.
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDate, Lucien
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.accessioned2021-10-15T14:15:35Z
dc.date.available2021-10-15T14:15:35Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.issn1355-8633
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9149
dc.source.beginpage73
dc.source.endpage76
dc.source.issue23
dc.source.journalSemiconductor Fabtech
dc.title

Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

dc.typeJournal article
dspace.entity.typePublication
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