Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

Kraus, P.A.; Chua, T.C.; Ahmed, K.Z.; Campbell, J.; Nouri, F.; Cruise, J.; Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, F.N.; Date, Lucien; Schreutelkamp, Rob; Bauer, T.M.

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Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

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2004

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Semiconductor Fabtech

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2088 since deposited on 2021-10-15

Acq. date: 2026-01-10

Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

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