dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Kremer, Stephanie | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Pollentier, Ivan | |
dc.date.accessioned | 2021-10-15T14:25:00Z | |
dc.date.available | 2021-10-15T14:25:00Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9190 | |
dc.source | IIOimport | |
dc.title | Optimization of scatterometry parameters for shallow trench isolation (STI) monitor | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 576 | |
dc.source.endpage | 586 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XVIII | |
dc.source.conferencedate | 22/02/2004 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; vol. 5375 | |