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Transfer of line edge roughness during gate patterning processes

dc.contributor.authorLeunissen, Peter
dc.contributor.authorErcken, Monique
dc.contributor.authorRonse, Kurt
dc.contributor.authorDerksen, Giljam B.
dc.date.accessioned2021-10-15T14:25:40Z
dc.date.available2021-10-15T14:25:40Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9193
dc.sourceIIOimport
dc.titleTransfer of line edge roughness during gate patterning processes
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage1
dc.source.endpage6
dc.source.conferenceProceedings 26th International Symposium on Dry Process
dc.source.conferencedate30/11/2004
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec
imec.internalnotesISBN 4-9900915-7-4


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