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Conference contributions
Impact of hyper-NA reticle properties on ArF immersion lithography
Publication:
Impact of hyper-NA reticle properties on ArF immersion lithography
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Date
2004-12
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leunissen, Peter
;
Ronse, Kurt
;
Philipsen, Vicky
;
Jonckheere, Rik
;
Aksenov, Yuri
;
Bekaert, Joost
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1943
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-12
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Metrics
Views
1943
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-12
Citations