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Integration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology

dc.contributor.authorLisoni, Judit
dc.contributor.authorJohnson, Jo
dc.contributor.authorGoux, Ludovic
dc.contributor.authorSchwitters, Michael
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorMaes, David
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorCaputa, Concetta
dc.contributor.authorCasella, P.
dc.contributor.authorZambrano, R.
dc.contributor.authorVecchio, G.
dc.contributor.authorMonchoix, H.
dc.contributor.authorVan Autryve, Luc
dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-15T14:30:31Z
dc.date.available2021-10-15T14:30:31Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9212
dc.sourceIIOimport
dc.titleIntegration of ferroelectric SrBi2Ta2O9-based capacitors in 0.35 μm CMOS technology
dc.typeJournal article
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecHaspeslagh, Luc::0000-0003-3561-3387
dc.source.peerreviewno
dc.source.beginpageS78
dc.source.endpageS82
dc.source.journalPhysica Status Solidi C
dc.source.issueS1
dc.source.volume1
imec.availabilityPublished - imec
imec.internalnotesProceedings XIth Latin American Congress of Surface Science and Its Applications (XI CLACSA)


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