Publication:
Fabrication of 50nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
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1860 since deposited on 2021-10-15
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Acq. date: 2026-08-05
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Statistics
Views
1860 since deposited on 2021-10-15
3last month
3last week
Acq. date: 2026-08-05
Citations