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In-line and non-destructive analysis of epitaxial Si1-x-yGexCy

dc.contributor.authorLoo, Roger
dc.contributor.authorDelhougne, Romain
dc.contributor.authorGeenen, Luc
dc.contributor.authorBrijs, Bert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMeunier-Beillard, Philippe
dc.contributor.authorKoumoto, T.
dc.date.accessioned2021-10-15T14:33:05Z
dc.date.available2021-10-15T14:33:05Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9222
dc.sourceIIOimport
dc.titleIn-line and non-destructive analysis of epitaxial Si1-x-yGexCy
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage40
dc.source.endpage47
dc.source.journalYield Management Solutions
dc.source.issue2
dc.source.volume6
imec.availabilityPublished - imec


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