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Liquid helium temperature irradiation effects on the operation of 0.7 μm CMOS devices for cryogenic space applications

dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorCreten, Ybe
dc.contributor.authorPutzeys, Jan
dc.contributor.authorMerken, Patrick
dc.contributor.authorDe Moor, Piet
dc.contributor.authorClaeys, Cor
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorSimoen, Eddy
dc.date.accessioned2021-10-15T14:49:58Z
dc.date.available2021-10-15T14:49:58Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9290
dc.sourceIIOimport
dc.titleLiquid helium temperature irradiation effects on the operation of 0.7 μm CMOS devices for cryogenic space applications
dc.typeProceedings paper
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorPutzeys, Jan
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecPutzeys, Jan::0000-0001-8834-5852
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecVan Hoof, Chris::0000-0002-4645-3326
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage91
dc.source.endpage99
dc.source.conferenceLow temperature Electronis and Low Temperature Cofired Ceramic Based Electronic Devices
dc.source.conferencedate11/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-27


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