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l/f noise in deep submicron CMOS technology for RF and analogue applications

dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorSimoen, Eddy
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-15T14:50:47Z
dc.date.available2021-10-15T14:50:47Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9293
dc.sourceIIOimport
dc.titlel/f noise in deep submicron CMOS technology for RF and analogue applications
dc.typeProceedings paper
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage193
dc.source.endpage207
dc.source.conferenceNoise in Devices and Circuits II
dc.source.conferencedate25/05/2004
dc.source.conferencelocationGran Canaria Spain
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5470


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