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Ultra low stress and low temperature patternable silicone materials for applications within microelectronics

dc.contributor.authorMeynen, Herman
dc.contributor.authorVanden Bulcke, Mathieu
dc.contributor.authorGonzalez, Mario
dc.contributor.authorHarkness, Brian
dc.contributor.authorGardner, Geoff
dc.contributor.authorSudbury-Holtschlag, Joan
dc.contributor.authorVandevelde, Bart
dc.contributor.authorWinters, Christophe
dc.contributor.authorBeyne, Eric
dc.date.accessioned2021-10-15T14:53:45Z
dc.date.available2021-10-15T14:53:45Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9302
dc.sourceIIOimport
dc.titleUltra low stress and low temperature patternable silicone materials for applications within microelectronics
dc.typeJournal article
dc.contributor.imecauthorVanden Bulcke, Mathieu
dc.contributor.imecauthorGonzalez, Mario
dc.contributor.imecauthorVandevelde, Bart
dc.contributor.imecauthorWinters, Christophe
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecVandevelde, Bart::0000-0002-6753-6438
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.source.peerreviewno
dc.source.beginpage212
dc.source.endpage218
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization; Brussels; March 2004


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