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Determination of stress profile and optimization of stress gradient in PECVD poly-SiGe films

dc.contributor.authorMolfese, Antonio
dc.contributor.authorMehta, Anshu
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-15T14:57:42Z
dc.date.available2021-10-15T14:57:42Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9318
dc.sourceIIOimport
dc.titleDetermination of stress profile and optimization of stress gradient in PECVD poly-SiGe films
dc.typeJournal article
dc.source.peerreviewno
dc.source.journalSensors and Actuators A
imec.availabilityPublished - imec
imec.internalnotesIn Press. Corrected proof available online 6 October 2004


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