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Optical lithography techniques for 0.25 μm and below: CD control issues

dc.contributor.authorVan den hove, Luc
dc.contributor.authorRonse, Kurt
dc.contributor.authorPforr, Rainer
dc.date.accessioned2021-09-29T13:18:44Z
dc.date.available2021-09-29T13:18:44Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/931
dc.sourceIIOimport
dc.titleOptical lithography techniques for 0.25 μm and below: CD control issues
dc.typeProceedings paper
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage24
dc.source.endpage30
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers
dc.source.conferencedate31/05/1995
dc.source.conferencelocation
imec.availabilityPublished - open access


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