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Microstructure evolution effects of helium redistribution in as-implanted silicon and Si0.8Ge0.2/Si heterostructures

dc.contributor.authorMorschbacher, M.J.
dc.contributor.authorda Silva, D.L.
dc.contributor.authorFichtner, P.F.P.
dc.contributor.authorOliviero, E.
dc.contributor.authorBehar, M.
dc.contributor.authorZawislak, F.C.
dc.contributor.authorHollander, B.
dc.contributor.authorLuysberg, M.
dc.contributor.authorMantl, S.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-15T14:59:01Z
dc.date.available2021-10-15T14:59:01Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9323
dc.sourceIIOimport
dc.titleMicrostructure evolution effects of helium redistribution in as-implanted silicon and Si0.8Ge0.2/Si heterostructures
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage703
dc.source.endpage707
dc.source.journalNuclear Instruments & Methods in Physics Research B
dc.source.volume219-220
imec.availabilityPublished - imec


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