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Direct measurement of barrier height at the HfO2/poly-Si interface:

dc.contributor.authorPantisano, Luigi
dc.contributor.authorChen, Pei Jun
dc.contributor.authorAfanas'ev, Valeri
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-15T15:16:50Z
dc.date.available2021-10-15T15:16:50Z
dc.date.issued2004-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9388
dc.sourceIIOimport
dc.titleDirect measurement of barrier height at the HfO2/poly-Si interface:
dc.typeProceedings paper
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewno
dc.source.beginpage122
dc.source.endpage123
dc.source.conferenceVLSI Technology Symposium
dc.source.conferencedate15/06/2004
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec


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