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Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions

dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorLisoni, Judit
dc.contributor.authorSchwitters, Michael
dc.contributor.authorMaes, David
dc.contributor.authorWouters, Dirk
dc.contributor.authorCasella, P.
dc.contributor.authorZambrano, R.
dc.contributor.authorVecchio, G.
dc.contributor.authorVan Autryve, Luc
dc.date.accessioned2021-10-15T15:18:28Z
dc.date.available2021-10-15T15:18:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9394
dc.sourceIIOimport
dc.titleIntegration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions
dc.typeOral presentation
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium D: Functional Oxides for Advanced Semiconductor Technologies
dc.source.conferencedate24/05/2004
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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