Publication:
HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
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1946 since deposited on 2021-10-15
21last month
6last week
Acq. date: 2026-10-10
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Statistics
Views
1946 since deposited on 2021-10-15
21last month
6last week
Acq. date: 2026-10-10
Citations