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Chemical and electrical dopants profile evolution during solid phase epitaxial regrowth

dc.contributor.authorPawlak, Bartek
dc.contributor.authorLindsay, Richard
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorDieu, Bjorn
dc.contributor.authorGeenen, Luc
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorRichard, Olivier
dc.contributor.authorDuffy, Ray
dc.contributor.authorClarysse, Trudo
dc.contributor.authorBrijs, Bert
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T15:22:30Z
dc.date.available2021-10-15T15:22:30Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9410
dc.sourceIIOimport
dc.titleChemical and electrical dopants profile evolution during solid phase epitaxial regrowth
dc.typeJournal article
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage297
dc.source.endpage301
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue1
dc.source.volume22
imec.availabilityPublished - imec


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