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Random deposition as a growth mode in atomic layer deposition

dc.contributor.authorPuurunen, Riikka
dc.date.accessioned2021-10-15T15:38:41Z
dc.date.available2021-10-15T15:38:41Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9471
dc.sourceIIOimport
dc.titleRandom deposition as a growth mode in atomic layer deposition
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage159
dc.source.endpage170
dc.source.journalChemical Vapor Deposition
dc.source.issue3
dc.source.volume10
imec.availabilityPublished - imec


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