Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
| dc.contributor.author | Puurunen, Riikka | |
| dc.date.accessioned | 2021-10-15T15:38:56Z | |
| dc.date.available | 2021-10-15T15:38:56Z | |
| dc.date.issued | 2004-05 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9472 | |
| dc.source | IIOimport | |
| dc.title | Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water | |
| dc.type | Journal article | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 4777 | |
| dc.source.endpage | 4786 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.issue | 9 | |
| dc.source.volume | 95 | |
| imec.availability | Published - imec |
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