Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
Publication:
Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
Copy permalink
Date
2004-05
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Puurunen, Riikka
Journal
Journal of Applied Physics
Abstract
Description
Metrics
Views
1892
since deposited on 2021-10-15
3
last month
1
last week
Acq. date: 2026-01-11
Citations
Metrics
Views
1892
since deposited on 2021-10-15
3
last month
1
last week
Acq. date: 2026-01-11
Citations