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Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
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Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
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Date
2004-05
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Puurunen, Riikka
Journal
Journal of Applied Physics
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1892
since deposited on 2021-10-15
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Acq. date: 2026-01-26
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Statistics
Views
1892
since deposited on 2021-10-15
2
last month
Acq. date: 2026-01-26
Citations