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Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors

dc.contributor.authorSchram, Tom
dc.date.accessioned2021-10-15T16:06:33Z
dc.date.available2021-10-15T16:06:33Z
dc.date.issued2004-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9570
dc.sourceIIOimport
dc.titlePerformance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors
dc.typeMeeting abstract
dc.contributor.imecauthorSchram, Tom
dc.source.peerreviewno
dc.source.conference13th workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate28/06/2004
dc.source.conferencelocationCork Ireland
imec.availabilityPublished - imec


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