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Process and substrate effects on the properties of MOCVD-deposited SrBi2Ta2O9 films

dc.contributor.authorSchwitters, M.
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorLisoni, Judit
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorGoux, Ludovic
dc.contributor.authorWouters, Dirk
dc.contributor.authorMonchoix, H.
dc.contributor.authorCaputa, Concetta
dc.contributor.authorZambrano, R.
dc.date.accessioned2021-10-15T16:08:46Z
dc.date.available2021-10-15T16:08:46Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9577
dc.sourceIIOimport
dc.titleProcess and substrate effects on the properties of MOCVD-deposited SrBi2Ta2O9 films
dc.typeOral presentation
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.source.peerreviewno
dc.source.conferenceThe 16th International Symposium on Integrated Ferroelectrics
dc.source.conferencedate5/04/2004
dc.source.conferencelocationGyeongju Korea
imec.availabilityPublished - imec


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