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Channel engineering towards a full low temperature process solution for the 45 nm technology node

dc.contributor.authorSeveri, Simone
dc.contributor.authorHenson, Kirklen
dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-15T16:09:57Z
dc.date.available2021-10-15T16:09:57Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9581
dc.sourceIIOimport
dc.titleChannel engineering towards a full low temperature process solution for the 45 nm technology node
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorDe Meyer, Kristin
dc.source.peerreviewno
dc.source.beginpage225
dc.source.endpage229
dc.source.conferenceProceedings of the 34th European Solid-State Device Research Conference - ESSDERC
dc.source.conferencedate21/09/2004
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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