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Clean dry strip process for implanted resist using water vapor plasma

dc.contributor.authorDaviet, Jean-François
dc.contributor.authorCoosemans, Frank
dc.contributor.authorVertommen, Johan
dc.date.accessioned2021-09-29T12:40:20Z
dc.date.available2021-09-29T12:40:20Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/95
dc.sourceIIOimport
dc.titleClean dry strip process for implanted resist using water vapor plasma
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage646
dc.source.endpage647
dc.source.conference186th Electrochemical Society Fall Meeting: Symposium on High Purity Silicon III
dc.source.conferencedate9/10/1994
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotesExtended Abstracts. Vol. 94-2


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