dc.contributor.author | Storms, Greet | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Pollentier, Ivan | |
dc.date.accessioned | 2021-10-15T16:28:32Z | |
dc.date.available | 2021-10-15T16:28:32Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9644 | |
dc.source | IIOimport | |
dc.title | Electrical linewidth metrology for sub-65-nm applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.source.peerreview | no | |
dc.source.beginpage | 614 | |
dc.source.endpage | 622 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XVIII | |
dc.source.conferencedate | 22/02/2004 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE, vol. 5375 | |