Plasma-induced 193-nm resist deformation: problems and a possible solution

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Authors
Struyf, Herbert; Dupont, Tania; Le, Quoc Toan; Boullart, Werner; Vanhaelemeersch, Serge
Conference
26th International Symposium on Dry Process
Title
Plasma-induced 193-nm resist deformation: problems and a possible solution
Publication type
Proceedings paper
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