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Characterization of high-k dielectrics by combined spectroscopic ellipsometry (SE) and x-ray reflectometry (XRR)

dc.contributor.authorSun, L.
dc.contributor.authorDefranoux, C.
dc.contributor.authorStehlé, J.L.
dc.contributor.authorBoher, P.
dc.contributor.authorEvrard, P.
dc.contributor.authorBellandi, E.
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T16:30:54Z
dc.date.available2021-10-15T16:30:54Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9652
dc.sourceIIOimport
dc.titleCharacterization of high-k dielectrics by combined spectroscopic ellipsometry (SE) and x-ray reflectometry (XRR)
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.beginpage95
dc.source.endpage101
dc.source.conferenceFundamentals of Novel Oxide/Semiconductor Interfaces
dc.source.conferencedate1/12/2003
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesMaterials Research Society Symposium Proceedings; Vol. 786


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