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dc.contributor.authorSurdeanu, Radu
dc.contributor.authorLindsay, Richard
dc.contributor.authorSeveri, Simone
dc.contributor.authorSatta, Alessandra
dc.contributor.authorPawlak, Bartek
dc.contributor.authorLauwers, Anne
dc.contributor.authorDachs, C.J.J.
dc.contributor.authorHenson, Kirklen
dc.contributor.authorMcCoy, S.
dc.contributor.authorGelpey, J.C.
dc.date.accessioned2021-10-15T16:31:32Z
dc.date.available2021-10-15T16:31:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9654
dc.sourceIIOimport
dc.titleIntegrating diffusionless anneals into advanced CMOS technologies
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorLauwers, Anne
dc.source.peerreviewno
dc.source.beginpage180
dc.source.endpage181
dc.source.conferenceExtended Abstracts of the International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate15/09/2004
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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