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Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBrijs, Bert
dc.contributor.authorCarter, R.
dc.contributor.authorCaymax, Matty
dc.contributor.authorCarbonell, Laure
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorCosnier, Vincent
dc.contributor.authorDate, Lucien
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKluth, J.
dc.contributor.authorPique, Didier
dc.contributor.authorRichard, Olivier
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorVereecke, Guy
dc.contributor.authorWitters, Thomas
dc.contributor.authorZhao, Chao
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T16:58:41Z
dc.date.available2021-10-15T16:58:41Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9741
dc.sourceIIOimport
dc.titleBulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
dc.typeJournal article
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.beginpageF228
dc.source.endpageF234
dc.source.journalJournal of the Electrochemical Society
dc.source.issue10
dc.source.volume151
imec.availabilityPublished - imec


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