Publication:

Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications

Date

2004

Journal article

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Author(s)

Van Elshocht, Sven

;

Baklanov, Mikhaïl

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;

;

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Carbonell, Laure

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Conard, Thierry

;

Cosnier, Vincent

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De Gendt, Stefan

;

;

;

Richard, Olivier

;

Vanhaeren, Danielle

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;

Witters, Thomas

;

;

Journal

Journal of the Electrochemical Society

Metrics

2058 since deposited on 2021-10-15

2last month

Acq. date: 2026-01-08