Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications

Simple item page Full metadata Statistics

Author(s)

Van Elshocht, Sven

;

Baklanov, Mikhaïl

;

;

;

;

Carbonell, Laure

;

;

Conard, Thierry

;

Cosnier, Vincent

;

;

De Gendt, Stefan

;

;

;

Richard, Olivier

;

Vanhaeren, Danielle

;

;

Witters, Thomas

;

;

Journal

Journal of the Electrochemical Society

Metrics

2054 since deposited on 2021-10-15

Acq. date: 2025-10-23