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A low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memories

dc.contributor.authorVan Houdt, Jan
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorWellekens, Dirk
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorHendrickx, Paul
dc.contributor.authorTsouhlarakis, Jorgo
dc.date.accessioned2021-10-15T17:05:37Z
dc.date.available2021-10-15T17:05:37Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9763
dc.sourceIIOimport
dc.titleA low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memories
dc.typeOral presentation
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorHendrickx, Paul
dc.contributor.imecauthorTsouhlarakis, Jorgo
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.source.peerreviewno
dc.source.conference20th IEEE Non-Volatile Semiconductor Memory Workshop - NVSMW
dc.source.conferencedate22/08/2004
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesonly handouts, no official proceedings


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