Show simple item record

Epitaxial Si thin films by high-temperature CVD

dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorDuerinckx, Filip
dc.contributor.authorBilyalov, Renat
dc.contributor.authorDekkers, Harold
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-15T17:08:48Z
dc.date.available2021-10-15T17:08:48Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9773
dc.sourceIIOimport
dc.titleEpitaxial Si thin films by high-temperature CVD
dc.typeProceedings paper
dc.contributor.imecauthorDuerinckx, Filip
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecDuerinckx, Filip::0000-0003-2570-7371
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage1178
dc.source.endpage1181
dc.source.conferenceProceedings of the 19th European Photovoltaic Solar Energy Conference
dc.source.conferencedate6/06/2004
dc.source.conferencelocationParis France
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record