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Chromeless phase lithography for contact hole imaging

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-15T17:20:14Z
dc.date.available2021-10-15T17:20:14Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9810
dc.sourceIIOimport
dc.titleChromeless phase lithography for contact hole imaging
dc.typeOral presentation
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.source.peerreviewno
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara (CA) USA
imec.availabilityPublished - imec


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